Simulation of near-field photolithography using the finite-difference time-domain method.

TANAKA S; NAKAO M; UMEDA M; ITO K; NAKAMURA S; HATAMURA Y

Art

J-GLOBAL ID：200902107332749383 Reference number：01A0542587

Simulation of near-field photolithography using the finite-difference time-domain method.

有限差分時間領域法を使用した近接場フォトリソグラフィーのシミュレーション

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Material：
Volume： 89 Issue： 7 Page： 3547-3553 Publication year： Apr. 01, 2001
JST Material Number： C0266A ISSN： 0021-8979 CODEN： JAPIAU Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Scattering,diffraction,interference of light. , Manufacturing technology of solid-state devices

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