Art
J-GLOBAL ID：200902111566254075   Reference number：01A0437256

Nonmagnetized plasma source.

プロセス用プラズマ技術 プラズマ源 I (無磁場)
Author (1)：
MIYAKE SHOJI

About MIYAKE SHOJI

(大阪大 接合科学研)

About 大阪大 接合科学研


Material：
応用物理  (JSAP International)

About 応用物理


Volume： 70  Issue： 4  Page： 460-464  Publication year： Apr. 10, 2001 
JST Material Number： F0252A  ISSN： 0369-8009  CODEN： OYBSA  Document type： Article
Article type： 解説  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*plasma source

About plasma source

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*plasma treatment

About plasma treatment


   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=01A0437256&from=J-GLOBAL&jstjournalNo=F0252A") }}
JST classification (1)：
JST classification
Category name(code) classified by JST.
Plasma devices 
(BJ02082I)

About Plasma devices

Reference (19)：
  • SUZUKI, K. Plasma Source Sci. & Technol. 1998, 7, 13
  • SETSUHARA, Y. Jpn. J. Appl. Phys. 1999, 38, 4263
  • SETSUHARA, Y. Proc. 18th Symp. Plasma Processing. 2001
  • 菅井秀郎編著. プラズマエレクトロニクス. 2000
  • LIEBERMAN, M. A. Principles of Plasma Discharge and Materials Processing. 1994
ｍore...
Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
プロセス

About プロセス

, 
プラズマ

About プラズマ

, 
プラズマ源

About プラズマ源

, 
磁場

About 磁場


Return to Previous Page

TOP

BOTTOM