Fine control of deposition film compositions using radio-frequency reactive sputtering with periodic gas additions.

KIMURA S; HONDA T; FUKUSHI D

Art

J-GLOBAL ID：200902117482512077 Reference number：00A0086141

Fine control of deposition film compositions using radio-frequency reactive sputtering with periodic gas additions.

周期的ガス添加を用いた高周波マグネトロンスパッタリングによる蒸着膜組成の精密制御

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Author (3)： , ,
Material：
Volume： 17 Issue： 6 Page： 3312-3316 Publication year： Nov. 1999
JST Material Number： C0789B ISSN： 0734-2101 CODEN： JVTAD6 Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Thin films of other inorganic compounds , Ceramic coating to metallic materials

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