Art

J-GLOBAL ID：200902120584958097   Reference number：96A0613971

Chemical Modification of Polymer Surface Using 185-nm Light.

185nmの光を用いる重合体表面の化学修飾

Author (3)： SHIRAI M (Osaka Prefecture Univ., Osaka, JPN) ,  YATSUO T (Osaka Prefecture Univ., Osaka, JPN) ,  TSUNOOKA M (Osaka Prefecture Univ., Osaka, JPN)
Material： Journal of Photopolymer Science and Technology  (フォトポリマー懇話会誌)
Volume： 9  Issue： 2  Page： 273-276  Publication year： 1996 
JST Material Number： L0202A  ISSN： 0914-9244  CODEN： JSTEEW  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： chemical vapor deposition ,...
Semi thesaurus term： far ultraviolet ray ,...

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JST classification (2)： Homopolymerization  (CG04020S) ,  Thin films of organic compounds  (BK14070L)

Substance index (4)： Methanesulfonic acid isopropylideneamino ester ,  Methanesulfonic acid 2,5-dioxo-1-pyrrolidinyl ester ,  [(1S,4R)-7,7-Dimethyl-2-oxobicyclo[2.2.1]heptan-1-yl]methanesulfonic acid isopropylideneamino ester ,  [(1S,4R)-7,7-Dimethyl-2-oxobicyclo[2.2.1]heptan-1-yl]methanesulfonic acid 2,5-dioxo-1-pyrrolidinyl ester

Reference (8)：

• 1). L. F. Thompson, C. G. Willson, M. J.Bowden, "Introduction toMicrolithography", American ChemicalSociety (1994) p. 239.
• 2). F. Coopmans, B. Roland, Proc. SPIE,631 (1986) 34.
• 3). G. N. Taylor, L. E. Stillwagon, T.Venkatesan, J. Electrochem. Soc., 131(1984) 1658.
• 4). D. Nalamasu, G. N. Taylor, Proc. SPIE,1086 (1989) 186.
• 5). M. Shirai, M. Tsunooka, Proc. 10thInternational Conference onPhotopolymers, New York, Mid-HudsonSection, SPE, Ellenville, New York(1994) p.128.

Terms in the title (3)： 重合 ,  体表面 ,  化学修飾