Preparation of Pb(Zr, Ti)O<sub>3</sub> Thin Films by Plasma-Assisted Sputtering.

HIOKI T; AKIYAMA M; UEDA T; ONOZUKA Y; SUZUKI K

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J-GLOBAL ID：200902121091097820 Reference number：99A0999510

Preparation of Pb(Zr, Ti)O₃ Thin Films by Plasma-Assisted Sputtering.

プラズマ支援スパッタリングによるPb(Zr,Ti)O₃薄膜の作製

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Material：
Volume： 38 Issue： 9B Page： 5375-5377 Publication year： Sep. 30, 1999
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Ferroelectrics,antiferroelectrics and ferroelasticity , Oxide thin films

Reference (18)：

1) K. Suzuki, M. Akiyama and Y. Onozuka: Proc. Asia Display 98 (1998) p. 879.
2) M. Akiyama, Y. Onozuka, T. Hioki, T. Ueda and K. Suzuki: Proc. IDW'98 (1998) p. 847.
3) S. M. Rossnagagel: J. Vac. Sci. & Technol. A 7 (1989) 1025.
4) J. Musil, S. Kadlic and W.-D. Munz: J. Vac. Sci. & Technol. A 9 (1991) 1171.
5) M. Matsuoka, Y. Hoshi and M. Naoe: J. Appl. Phys. 63 (1988) 2098.

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Preparation of Pb(Zr, Ti)O3 Thin Films by Plasma-Assisted Sputtering.

Preparation of Pb(Zr, Ti)O₃ Thin Films by Plasma-Assisted Sputtering.