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J-GLOBAL ID:200902122832218049   Reference number:99A0246523

Surface conditioning of chemical vapor deposited hexagonal boron nitride film for negative electron affinity.

負の電子親和力に対する化学蒸着の六方晶窒化ほう素薄膜の表面条件
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Volume: 74  Issue:Page: 28-30  Publication year: Jan. 04, 1999 
JST Material Number: H0613A  ISSN: 0003-6951  CODEN: APPLAB  Document type: Article
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Semiconductor thin films 
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