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J-GLOBAL ID：200902126794854926   Reference number：00A0692995

157 nm Resist Materials: A Progress Report.

157nmレジスト材料 進捗報告

Author (9)： CHIBA T (Univ. Texas at Austin, TX) ,  HUNG R J (Univ. Texas at Austin, TX) ,  YAMADA S (Univ. Texas at Austin, TX) ,  TRINQUE B (Univ. Texas at Austin, TX) ,  YAMACHIKA M (Univ. Texas at Austin, TX) ,  SOMERVELL M (Univ. Texas at Austin, TX) ,  BYERS J (SEMATECH, TX) ,  CONLEY W (SEMATECH, TX) ,  WILLSON C G (Univ. Texas at Austin, TX)
Material： Journal of Photopolymer Science and Technology  (フォトポリマー懇話会誌)
Volume： 13  Issue： 4  Page： 657-664  Publication year： 2000 
JST Material Number： L0202A  ISSN： 0914-9244  CODEN： JSTEEW  Document type： Article
Article type： 文献レビュー  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *chemically amplified resist ,...

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JST classification (3)： Manufacturing technology of solid-state devices  (NC03030V) ,  Aliphatic halogen compounds  (CF03050P) ,  Halogen containing polymers  (YH07100Z)

Substance index (4)： 2-Fluoronorbornane ,  2,2-Difluoronorbornane ,  α-(Trifluoromethyl)acrylic acid methyl ester ,  Carbonic acid [1,1-bis(trifluoromethyl)-2-(norborna-5-ene-2-yl)ethyl]tert-butyl ester

Reference (14)：

• 1). R. R. Kunz, T. M. Bloomstein, D. E. Hardy, R. B. Goodman, D. K. Downs and J. E. Curtin, Proc. SPIE, 3678 (1999)13-23.
• 2). K. Patterson, M. Yamachika, J. D. Byers, B. Osborn, D. Hall, G. Dukovic, S. Yamada, R. Hung, C. J. Brodsky, S. Cho and C. G. Willson, Proc. SPIE, 3999-37 (2000), in press.
• 3). N. N. Matsuzawa, S. Mori, E. Yano, S. Okazaki, A. Ishitani and D. A. Dixon, Proc. SPIE, 3999-38 (2000), in press.
• 4). E. L. Varetti and P. J. Aymonino, J. Mol. Struct., 7(1971) 155-171.
• 5). C. Botteghi, C. Lando, U. Matteoli, S. Paganelli and G. Menchi, J. Fluorine Chem., 83 (1997) 67-71.

Terms in the title (2)： レジスト材料 ,  報告