Art

J-GLOBAL ID：200902129888272334   Reference number：00A0174728

Sulfonic Acid Generating Polymers for 146 nm Irradiation.

146nmの照射におけるスルホン酸発生重合体

Author (3)： SHIRAI M (Osaka Prefecture Univ., Osaka, JPN) ,  SHINOZUKA T (Osaka Prefecture Univ., Osaka, JPN) ,  TSUNOOKA M (Osaka Prefecture Univ., Osaka, JPN)
Material： Journal of Photopolymer Science and Technology  (フォトポリマー懇話会誌)
Volume： 12  Issue： 5  Page： 721-724  Publication year： 1999 
JST Material Number： L0202A  ISSN： 0914-9244  CODEN： JSTEEW  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： vacuum ultraviolet radiation ,...

   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=00A0174728&from=J-GLOBAL&jstjournalNo=L0202A") }}

JST classification (3)： Manufacturing technology of solid-state devices  (NC03030V) ,  Photosensitive materials  (ZA03020Q) ,  Gas lasers  (BD04040E)

Substance index (8)： Methacrylic acid methyl ,  Methacrylic acid tert-butyl ,  Isopropylideneamino 4-styrenesulfonate ,  4-[[Tetralin-1-ylidene]aminooxysulfonyl]styrene ,  [(9H-Fluorene-9-ylidene)amino]4-styrenesulfonate ,  4-Styrenesulfonic acid 2,5-dioxo-1-pyrrolidinyl ester ,  4-Styrenesulfonic acid 1,3,3a,4,7,7a-hexahydro-1,3-dioxo-4,7-methano-2H-isoindole-2-yl ester ,  4-Styrenesulfonic acid 1,3-dioxoisoindoline-2-yl ester

Reference (9)：

• 1). H. Ito, E. Reichmanis, O. Nalamasu and T. Ueno, "Micro- and Nanopatterning Polymers", American Chemistry Society, Washington D.C. (1998).
• 2). T. Matsuo, M. Endo, M. Shirai and M. Tsunooka, J. Photopolym. Sci. Technol., 10 (1997) 595.
• 3). M. Shirai, N. Nogi and M. Tsunooka, Reactive Functional Polym., 37 (1998) 147.
• 4). K. H. Chae, Y. J. Oh, J. Photopolym. Sci. Technol., 7 (1994) 183.
• 5). M. Shirai, T. Yamamoto and M. Tsunooka, Polym. Degrad. Stab., 63 (1999) 481.

Terms in the title (2)： スルホン酸 ,  重合体