Art

J-GLOBAL ID：200902132918075980   Reference number：00A0935143

Validity and Limitation of a Proximity-Compensation Method for Febricating Diffractive Optical Elements Using the Direct-Writing Electron-Beam Lithography.

回折光学素子作製のための電子ビーム近接効果補正法の有効性と限界

Author (5)： OKANO MASATO (大阪科学技術セ) ,  YAMAMOTO KAZUYA (ナルックス) ,  YOTSUYA TSUTOMU (大阪科学技術セ) ,  HIRAI YOSHIHIKO (大阪府大 工) ,  KIKUTA HISAO (大阪府大 工)
Material： 光学  (Japanese Journal of Optics)
Volume： 29  Issue： 9  Page： 566-572  Publication year： Sep. 10, 2000 
JST Material Number： G0125B  ISSN： 0389-6625  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： JAPANESE (JA)

Thesaurus term： *diffraction grating ,...
Semi thesaurus term： blazed grating

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JST classification (2)： Optical devices in general  (BD06010L) ,  Manufacturing technology of solid-state devices  (NC03030V)

Reference (15)：

• FUJITA, T. Fabrication of microlenses using electron-beam lithography. Opt. Lett. 1981, 6, 613-615
• SHIONO, T. Diffraction-limited blazed reflection diffractive microlenses for oblique incidence fabricated by electron-beam lithography. Appl. Opt. 1991, 30, 3643-3649
• DI FABRIZIO, E. One step electron-beam lithography for multipurpose diffractive optical elements with 200 nm resolution. J. Vac. Sci. Technol. B. 1996, 14, 3855-3859
• KLEY, E.-B. Continuous profile writing by electron and optical lithography. Microelectron. Eng. 1997, 34, 261-298
• DASCHNER, W. Fabrication of monolithic diffractive optical elements by the use of e-beam direct write on an analog resist and a single chemically assisted ion-beam-etching step. Appl. Opt. 1995, 34, 2534-2539

Terms in the title (6)： 回折光学素子 ,  作製 ,  電子ビーム ,  近接効果補正 ,  有効性 ,  限界