Art
J-GLOBAL ID：200902134710956730
Reference number：98A0987450
Ru Electrode Deposited by Sputtering in Ar/O2 Mixture Ambient.
Ar/O2混合物雰囲気中でのスパッタリングにより堆積したRu電極
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Author (3)：
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Material：
Volume：
37
Issue：
10
Page：
5701-5707
Publication year：
Oct. 1998
JST Material Number：
G0520B
ISSN：
0021-4922
Document type：
Article
Article type：
原著論文
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Metallic thin films
, Electric materials in general
Reference (13)：
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1) T. Aoyama, S. Saida, Y. Okayama, M. Fujisaki, K. Imai and T. Arikado: J. Electrochem. Soc. 143 (1996) 977.
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2) H. Yamaguchi, P.-Y. Lesaicherre, T. Sakuma, Y. Miyasaka, A. Ishitani and M. Yoshida: Jpn. J. Appl. Phys. 32 (1993) 4069.
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3) H. Yamaguchi, T. Iizuka, H. Koga, K. Takemura, S. Sone, H. Yabuta, S. Yamamichi, P.-Y. Lesaicherre, M. Suzuki, Y. Kojima, K. Nakajima, N. Kasai, T. Sakuma, Y. Kato, Y. Miyasaka, M. Yoshida and S. Nishimoto: `96 IEEE IEDM Tech. Dig. (IEEE, Piscataway, 1996) p. 675.
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4) A. Yuuki, M. Yamamuka, T. Makita, T. Horikawa, T. Shibano, N. Hirano, H. Maeda, N. Mikami, K. Ono, H. Ogata and H. Abe: `95 IEEE IEDM Tech. Dig. (IEEE, Piscataway, 1995) p. 115.
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5) S. Yamamichi, P.-Y. Lesaicherre, H. Yamaguchi, K. Takemura, S. Sone, H. Yabuta, K. Sato, T. Tamura, K. Nakajima, S. Ohnishi, K. Tokashiki, Y. Hayashi, Y. Kato, Y. Miyasaka, M. Yoshida and H. Ono: `95 IEEE IEDM Tech. Dig. (IEEE, Piscataway, 1995) p. 119.
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Terms in the title (7)：
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