I-Line Sensitive Photoacid and Photobase Generators and Their Use for Photocrosslinking System Based on Poly(vinylphenol) and Diepoxy Fluorene Derivatives.

OKAMURA H; WATANABE Y; TSUNOOKA M; SHIRAI M; FUJIKI T; KAWASAKI S; YAMADA M

Art

J-GLOBAL ID：200902136830124072 Reference number：02A0616840

I-Line Sensitive Photoacid and Photobase Generators and Their Use for Photocrosslinking System Based on Poly(vinylphenol) and Diepoxy Fluorene Derivatives.

I線感応の光酸発生剤および光塩基発生剤ならびにポリ(ビニルフェノール)とジエポキシフルオレン誘導体をベースとする光橋かけ系への応用

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Author (7)： , , , , , ,
Material：
Volume： 15 Issue： 1 Page： 145-152 Publication year： 2002
JST Material Number： L0202A ISSN： 0914-9244 CODEN： JSTEEW Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices

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4). H. Okamura, C. Harada, S. Morishita, M. Shirai, M. Tsunooka, T. Fujiki, S. Kawasaki, M. Yamada, J. Photopolym. Sci. Technol., 14 (2001) 159.
5). K. Ito, Y. Shigeru, Y. Kawata, K. Ito, M. Tsunooka, Can. J Chem., 73 (1995) 1924.

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