Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations.

NAMATSU H; TAKAHASHI Y; YAMAZAKI K; YAMAGUCHI T; NAGASE M; KURIHARA K

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J-GLOBAL ID：200902138976447283 Reference number：98A0348904

Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations.

線幅ゆらぎが最小のナノパターンを形成するための三次元シロキサンレジスト

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Author (6)： , , , , ,
Material：
Volume： 16 Issue： 1 Page： 69-76 Publication year： Jan. 1998
JST Material Number： E0974A ISSN： 1071-1023 CODEN： JVTBD9 Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices

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