Effects of He Gas Addition on the Production of Active Particles in rf Magnetron Sputtering.

HARADA K; KISHIDA S; MATSUOKA T; MURUYAMA T; TOKUTAKA H; FUJIMURA K; KOYANAGI T; FUJII T

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J-GLOBAL ID：200902139910318845 Reference number：96A0705043

Effects of He Gas Addition on the Production of Active Particles in rf Magnetron Sputtering.

rfマグネトロンスパッタリングにおける活性粒子生成へのHeガス添加の効果

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Material：
Volume： 35 Issue： 6A Page： 3590-3594 Publication year： Jun. 1996
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Properties of oxide superconductors , Oxide thin films

Reference (10)：

DESHMUKH, S. Appl.Phys.Lett. 1988, 53, 2698
WU, X. D. Appl.Phys.Lett. 1989, 55, 179
KLEIN, J. D. Appl.Phys.Lett. 1989, 55, 2670
XI, X. X. Appl.Phys.Lett. 1990, 57, 96
MAEDA, H. Jpn.J.Appl.Phys. 1988, 27, L1209

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