Automatic Dose Optimization System for Resist Cross-Sectional Profile in a Electron Beam Lithography.

HIRAI Y; KIKUTA H; OKANO M; YOTSUYA T; YAMAMOTO K

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J-GLOBAL ID：200902148420983831 Reference number：01A0212498

Automatic Dose Optimization System for Resist Cross-Sectional Profile in a Electron Beam Lithography.

電子ビームリソグラフィーにおけるレジスト断面プロファイルの自動ドーズ最適化システム

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Material：
Volume： 39 Issue： 12B Page： 6831-6835 Publication year： Dec. 30, 2000
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices , Applications of electron beams and ion beams

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5) T. Chang: J. Vac. Sci. & Technol. <B>12</B> (1975) 1271.

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