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J-GLOBAL ID:200902158857024189   Reference number:96A0613996

A Novel Polymer for a 193-nm Resist.

193nmレジスト用の新規の重合体
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Volume:Issue:Page: 509-522  Publication year: 1996 
JST Material Number: L0202A  ISSN: 0914-9244  CODEN: JSTEEW  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Other reactions of polymer  ,  Acrylic resins  ,  Manufacturing technology of solid-state devices 
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