Art
J-GLOBAL ID:200902162739251046   Reference number:97A0667509

Gas Source Molecular Beam Epitaxy Growth of GaN on C-, A-, R- and M-Plane Sapphire and Silica Glass Substrates.

C面,A面,R面およびM-面サファイヤとシリカガラス基板へのGaNのガスソース分子線エピタクシー成長
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Material:
Volume: 36  Issue: 6A  Page: L661-L664  Publication year: Jun. 01, 1997 
JST Material Number: F0599B  ISSN: 0021-4922  Document type: Article
Article type: 短報  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Semi thesaurus term:
Thesaurus term/Semi thesaurus term
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On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.

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Semiconductor thin films 

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