High-speed single-layer-resist process and energy-dependent aspect ratios for 0.2-μm electron-beam lithography.

MURAI F; YAMAMOTO J; YAMAGUCHI H; OKAZAKI S; SATO K; HASEGAWA K; HAYAKAWA H

Art

J-GLOBAL ID：200902167428301270 Reference number：95A0141445

High-speed single-layer-resist process and energy-dependent aspect ratios for 0.2-μm electron-beam lithography.

0.2μm電子ビームリソグラフィーのための高速単層レジスト過程及びエネルギー依存アスペクト比

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Material：
Volume： 12 Issue： 6 Page： 3874-3878 Publication year： Nov. 1994
JST Material Number： E0974A ISSN： 1071-1023 CODEN： JVTBD9 Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices , Applications of electron beams and ion beams

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