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J-GLOBAL ID:200902181368584831   Reference number:01A0851866

A Study on Electrochemical Machining Method in Ultrapure Water. Etching Process of Si(001) Surface Atom by Hydroxyl Function.

超純水のみによる電気化学的加工法の研究 水素終端化されていないSi(001)表面原子とOHとの反応素過程
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Volume: 67  Issue:Page: 1321-1326  Publication year: Aug. 05, 2001 
JST Material Number: F0268A  ISSN: 0912-0289  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Manufacturing technology of solid-state devices 
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