Art

J-GLOBAL ID：200902192702901179   Reference number：99A0120659

Chemical-Vapor Deposition of OH-free and Low-k Organic-Silica Films.

OHを含まずkの低い有機シリカ膜の化学蒸着

Author (5)： UCHIDA Y (Teikyo Univ. Sci. and Technol., Yamanashi, JPN) ,  TAGUCHI K (Teikyo Univ. Sci. and Technol., Yamanashi, JPN) ,  NAGAI T (Teikyo Univ. Sci. and Technol., Yamanashi, JPN) ,  SUGAHARA S (Tokyo Inst. Technol., Tokyo, JPN) ,  MATSUMURA M (Tokyo Inst. Technol., Tokyo, JPN)
Material： Japanese Journal of Applied Physics. Part 1. Regular Papers, Short Notes & Review Papers  (Japanese Journal of Applied Physics. Part 1. Regular Papers, Brief Communications & Review Papers)
Volume： 37  Issue： 12A  Page： 6369-6373  Publication year： Dec. 1998 
JST Material Number： G0520B  ISSN： 0021-4922  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *chemical vapor deposition ,...
Semi thesaurus term： *silica

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JST classification (1)： Thin films of organic compounds  (BK14070L)

Substance index (4)： Orgatics SI-310 ,  Diisocyanatodimethylsilane ,  Trimethylsilyl isocyanate ,  Tetramethylsilane

Reference (13)：

• 1) T. Usami, K. Shimokawa and M. Yoshimaru: Jpn. J. Appl. Phys. 33 (1994) 408
• 2) T. Homma, Y. Murao and R. Yamaguchi: J. Electrochem. Soc. 141 (1994) 3599.
• 3) T. Nakano, K. Tokunaga and T. Ohta: J. Electrochem. Soc. 142 (1995) 1303.
• 4) C. M. Haines, J. I. Ladouce, A. B. Currie and C. M. Syktich: Proc. 3rd Int. Conf. DUMIC, Santa Clara, 1997 (VMIC, Tampa, 1997) p. 317.
• 5) G. Sugahara, N. Aoi, M. Kubo, K. Arai and K. Sawada: Proc. 3rd Int. Conf. DUMIC, Santa Clara, 1997 (VMIC, Tampa, 1997) p. 19.

Terms in the title (2)： シリカ膜 ,  化学蒸着