Art
J-GLOBAL ID：200902195187609736   Reference number：00A0491885

Photochemical Dissociation of Organic Silicon Source using Xe2 Excimer Lamp in Gas Phase.

Xe2エキシマーランプを用いた有機シリコン原料の気相における光分解
Author (3)：
HORII(MAEDA) NAOHIRO

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(福井工高専)

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, 
OKIMURA KUNIO

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(東海大)

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, 
INOUE AKIHIRO

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(福井工高専)

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Material：
真空  (Journal of the Vacuum Society of Japan)

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Volume： 43  Issue： 3  Page： 288-291  Publication year： Mar. 20, 2000 
JST Material Number： G0194A  ISSN： 0559-8516  CODEN： SHINA  Document type： Article
Article type： 短報  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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inorganic acid ester

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,...
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JST classification (2)：
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Photochemical reactions 
(CB08020F)

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,  Oxide thin films 
(BK14050P)

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Substance index (1)：
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Tetraethoxysilane

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Terms in the title (4)：
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エキシマーランプ

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, 
シリコン原料

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, 
気相

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, 
光分解

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