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J-GLOBAL ID:200902195335361226   Reference number:01A0734003

Formation of Vertically Aligned Carbon Nanotubes by Dual-RF-Plasma Chemical Vapor Deposition.

二重RFプラズマ化学気相蒸着法による垂直配向カーボンナノチューブの形成
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Volume: 40  Issue: 6B  Page: L631-L634  Publication year: Jun. 15, 2001 
JST Material Number: F0599B  ISSN: 0021-4922  Document type: Article
Article type: 短報  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Atomic and molecular clusters  ,  Semiconductor thin films 
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