Preparation of Diamond Mold Using Electron Beam Lithography for Application to Nanoimprint Lithography.

TANIGUCHI J; TOKANO Y; MIYAMOTO I; KOMURO M; HIROSHIMA H; KOBAYASHI K; MIYAZAKI T; OHYI H

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J-GLOBAL ID：200902196026589251 Reference number：01A0212544

Preparation of Diamond Mold Using Electron Beam Lithography for Application to Nanoimprint Lithography.

ナノインプリントリソグラフィーに適用するための電子ビームリソグラフィーを使ったダイヤモンドモールドの作製

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Material：
Volume： 39 Issue： 12B Page： 7070-7074 Publication year： Dec. 30, 2000
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Techniques for samples , Manufacturing technology of solid-state devices

Reference (8)：

1) J. Xiao, J. Garofalo, R. Cirelli and S. Vaidya: J. Vac. Sci. & Technol. B13 (1995) 2897.
2) H. C. Preiffer, D. E. Davies, W. A. Enichen, M. S. Gordon, T. R. Groves, J. G. Hartley, R. J. Qickle, J. D. Rockrohr, W. Stickel and E. V. Webber: J. Vac. Sci. & Technol. B11 (1993) 2332.
3) A. Murray, D. Colby, R. Teizel and M. Gesley: J. Vac. Sci. & Technol. B13 (1995) 2488.
4) K. Early, M. L. Schattenburg and H. I. Smith: Microelectron. Eng. 11 (1990) 317.
5) W. H. Brunger, L. M. Buchmann, M. A. Torkler and W. Finkelstein: J. Vac. Sci. & Technol. B12 (1994) 3547.

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