Art
J-GLOBAL ID：200902209980471800   Reference number：04A0020987

Influence of sputtering conditions on the structure and properties of Ti-Si-N thin films prepared by r.f.-reactive sputtering

rf反応性スパッタリングで作製したTi-Si-N薄膜の構造と性質におよぼすスパッタリング条件の効果
Author (6)：
NOSE M

About NOSE M

(Takaoka National Coll., Takaoka, JPN)

About Takaoka National Coll., Takaoka, JPN

, 
DEGUCHI Y

About DEGUCHI Y

(Toyama Univ., Toyama, JPN)

About Toyama Univ., Toyama, JPN

, 
MAE T

About MAE T

(Toyama National Coll. of Technol., Toyama, JPN)

About Toyama National Coll. of Technol., Toyama, JPN

, 
HONBO E

About HONBO E

(Toyama Industrial Res. Center, Takaoka, JPN)

About Toyama Industrial Res. Center, Takaoka, JPN

, 
NAGAE T

About NAGAE T

(Toyama Industrial Res. Center, Takaoka, JPN)

About Toyama Industrial Res. Center, Takaoka, JPN

, 
NOGI K

About NOGI K

(Osaka Univ., Ibaraki, JPN)

About Osaka Univ., Ibaraki, JPN


Material：
Surface & Coatings Technology  (Surf Coat Technol)

About Surface & Coatings Technology


Volume： 174/175  Page： 261-265  Publication year： Sep. 2003 
JST Material Number： D0205C  ISSN： 0257-8972  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
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reactive sputtering

About reactive sputtering

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
ナノ押込

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JST classification (1)：
JST classification
Category name(code) classified by JST.
Thin films of other inorganic compounds 
(BK14060A)

About Thin films of other inorganic compounds

Terms in the title (8)：
Terms in the title
Keywords automatically extracted from the title.
RF

About RF

, 
反応性スパッタリング

About 反応性スパッタリング

, 
作製

About 作製

, 
Ti

About Ti

, 
Si

About Si

, 
薄膜

About 薄膜

, 
性質

About 性質

, 
スパッタリング

About スパッタリング


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