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J-GLOBAL ID:200902246083485001   Reference number:05A0564405

Carrier separation analysis for clarifying carrier conduction and degradation mechanisms in high-k stack gate dielectrics

高誘電率スタックゲート誘電体におけるキャリア伝導および劣化の機構解明のためのキャリア分離解析
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Material:
Volume: 45  Issue: 7-8  Page: 1041-1050  Publication year: Jul. 2005 
JST Material Number: C0530A  ISSN: 0026-2714  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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Transistors  ,  Oxide thin films  ,  Measurement,testing and reliability of solid-state devices 

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