Art

J-GLOBAL ID：200902266644233377   Reference number：08A0996346

Photochemical Reaction of Ozone and 1,1,1,3,3,3-Hexamethyldisilazane: Analysis of the Gas Reaction between Precursors in a Photochemical Vapor Deposition Process

オゾンと1,1,1,3,3,3-ヘキサメチルジシラザンとの光化学反応 光化学蒸着過程での前駆体間の気相反応の解析

Author (7)： NAKAMURA Ken (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  NONAKA Hidehiko (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  KAMEDA Naoto (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  KAMEDA Naoto (Meidensha Corp., Shizuoka, JPN) ,  NISHIGUCHI Tetsuya (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  NISHIGUCHI Tetsuya (Meidensha Corp., Shizuoka, JPN) ,  ICHIMURA Shingo (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
Material： Japanese Journal of Applied Physics  (JJAP)
Volume： 47  Issue： 9 Issue 1  Page： 7349-7355  Publication year： Sep. 25, 2008 
JST Material Number： G0520B  ISSN： 0021-4922  CODEN： JJAPB6  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)

Thesaurus term： *photochemical reaction ,  ozone ,  precursor(substance) ,  *gas phase reaction ,  *photo-CVD ,  ultraviolet irradiation ,  side reaction ,  FTIR spectroscopy ,  carbon dioxide ,  nitrogen ,  water ,  mass spectrometry ,  covalent bond ,  reaction intermediate ,  carbonyl group ,  carboxy group
Semi thesaurus term： carboxyl group ,  光化学蒸着

JST classification (1)： Thin films of organic compounds  (BK14070L)

Substance index (1)： Hexamethyldisilazane

Reference (18)：

• International Roadmap Committee, International Technology Roadmap for Semiconductors, 2005 edition and 2006 update [http://www.itrs.net/].
• L.-Q. Xia, P. W. Lee, M. Chang, I. Latchford, P. K. Narwankar, R. Urdahl, A. S. Nickles, R. Achutharaman, and C. B. Lewis: in Handbook of Semiconductor Manufacturing Technology, ed. Y. Nishi and R. Doering (Marcel Dekker, New York, 2000) p. 309.
• S. M. Sze: Semiconductor Devices, Physics and Technology (Wiley, New York, 2002) 2nd ed., p. 414.
• H. Yonezawa: Colloids Surf.9(1984)133.
• T. Nishiguchi, H. Nonaka, S. Ichimura, Y. Morikawa, M. Kekura, and M. Miyamoto: Appl. Phys. Lett.81(2002)2190.

Terms in the title (8)： オゾン ,  ヘキサメチルジシラザン ,  光化学反応 ,  光化学 ,  蒸着過程 ,  前駆体 ,  気相反応 ,  解析