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J-GLOBAL ID:200902284114320250   Reference number:05A0996476

Electrical Characterization of Germanium Oxide/Germanium Interface Prepared by Electron-Cyclotron-Resonance Plasma Irradiation

電子サイクロトロン共鳴プラズマ照射により調製した酸化ゲルマニウム/ゲルマニウム界面の電気的特性評価
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Volume: 44  Issue: 9B  Page: 6981-6984  Publication year: Sep. 30, 2005 
JST Material Number: G0520B  ISSN: 0021-4922  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Dielectrics in general 
Reference (13):
  • 1) K. Rim, S. Koester, M. Hargrove, J. Chu, P. M. Mooney, J. Ott, T. Kanarsky, P. Ronsheim, M. Ieong, A. Grill and H.-S. P. Wong: Proc. 2001 Symp. VLSI Technology (2001) p. 59.
  • 2) G. Hock, E. Kohn, C. Rosenblad, H. von Kanel, H.-J. Herzog and U. Konig: Appl. Phys. Lett. 76 (2000) 3920.
  • 3) H. Shang, H. Okorn-Schimdt, J. Ott, P. Kozlowski, S. Steen, E. C. Jones, H.-S. P. Wong and W. Hanesch: IEEE Electron Device Lett. 24 (2003) 242.
  • 4) H. Shang, K.-L. Lee, P. Kozlowski, C. D’Emic, I. Babich, E. Sikorski, M. Ieong, H.-S. P. Wong, K. Guarini and W. Hanesch: IEEE Electron Device Lett. 25 (2004) 135.
  • 5) J.-P. Han, E. M. Vogel, E. P. Gusev, C. D’Emic, C. A. Richter, D. W. Heh and J. S. Suehle: IEEE Electron Device Lett. 25 (2004) 126.
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