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J-GLOBAL ID:200902293425714138   Reference number:08A0149266

Catalyst-referred etching

触媒基準エッチング法
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Volume: 77  Issue:Page: 168-171  Publication year: Feb. 10, 2008 
JST Material Number: F0252A  ISSN: 0369-8009  CODEN: OYBSA  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Manufacturing technology of solid-state devices 
Reference (12):
  • 土肥俊郎. 諸説・半導体CMP技術. 2001
  • 山内和人. 特開2006-114632
  • HARA, H. J. Electron. Mater. 2006, 35, L11
  • 松波弘之. 半導体SiC技術と応用. 2003
  • KATO, T. Mater. Sci. Forum. 2007, 556, 753
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