Art
J-GLOBAL ID:200902294178200742   Reference number:05A0410972

Growth rate of silicon nanowires

シリコンナノ細線の成長速度
Author (3):
Material:
Volume: 86  Issue: 12  Page: 123109.1-123109.3  Publication year: Mar. 21, 2005 
JST Material Number: H0613A  ISSN: 0003-6951  CODEN: APPLAB  Document type: Article
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=05A0410972&from=J-GLOBAL&jstjournalNo=H0613A") }}
JST classification (1):
JST classification
Category name(code) classified by JST.
Semiconductor thin films 
Substance index (1):
Substance index
Chemical Substance indexed to the Article.
Terms in the title (2):
Terms in the title
Keywords automatically extracted from the title.

Return to Previous Page