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J-GLOBAL ID:200902299577372281   Reference number:06A0417905

Deoxidization of Cu Oxide under Extremely Low Oxygen Pressure Ambient

極低酸素圧雰囲気下のCu酸化膜の脱酸素
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Volume: 45  Issue: 12-16  Page: L393-L395  Publication year: Apr. 25, 2006 
JST Material Number: F0599B  ISSN: 0021-4922  Document type: Article
Article type: 短報  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Semiconductor integrated circuit  ,  Manufacturing technology of solid-state devices 
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