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J-GLOBAL ID:201002291522620103   Reference number:10A0133838

An Extreme Ultraviolet Source for Photolithographic Applications Based on Rotamak Discharge

Rotomak放電に基づいたフォトリソグラフィー応用のための極端紫外線源
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Volume: 49  Issue: 1,Issue 1  Page: 016201.1-016201.4  Publication year: Jan. 25, 2010 
JST Material Number: G0520B  ISSN: 0021-4922  CODEN: JJAPB6  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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Radiation sources,irradiation equipment  ,  Plasma production and heating 
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