Art
J-GLOBAL ID：201102266702661153   Reference number：11A1249951

EUV Negative Resist Based on Thiol-Yne System

thiol-yne系に基づくEUVネガ型レジスト
Author (5)：
SHIRAI Masamitsu

About SHIRAI Masamitsu

(Osaka Prefecture Univ., Osaka, JPN)

About Osaka Prefecture Univ., Osaka, JPN

, 
MAKI Koichi

About MAKI Koichi

(Osaka Prefecture Univ., Osaka, JPN)

About Osaka Prefecture Univ., Osaka, JPN

, 
OKAMURA Haruyuki

About OKAMURA Haruyuki

(Osaka Prefecture Univ., Osaka, JPN)

About Osaka Prefecture Univ., Osaka, JPN

, 
KANEYAMA Koji

About KANEYAMA Koji

(Semiconductor Leading Edge Technol., Inc., Ibaraki-ken, JPN)

About Semiconductor Leading Edge Technol., Inc., Ibaraki-ken, JPN

, 
ITANI Toshiro

About ITANI Toshiro

(Semiconductor Leading Edge Technol., Inc., Ibaraki-ken, JPN)

About Semiconductor Leading Edge Technol., Inc., Ibaraki-ken, JPN


Material：
Proceedings of SPIE  (Proceedings. SPIE - The International Society for Optical Engineering)

About Proceedings of SPIE


Volume： 7972  Issue： Pt.1  Page： 79721E.1-79721E.8  Publication year： 2011 
JST Material Number： D0943A  ISSN： 0277-786X  CODEN： PSISDG  Document type： Proceedings
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*chemically amplified resist

About chemically amplified resist

, 
*extreme ultraviolet

About extreme ultraviolet

, 
photolithography

About photolithography

, 
high sensitivity

About high sensitivity

, 
surface roughness

About surface roughness

, 
thiol

About thiol

, 
aqueous solution

About aqueous solution


Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
EUV resist

About EUV resist

, 
negative type resist

About negative type resist

, 
LER

About LER

, 
line width roughness

About line width roughness


JST classification (1)：
JST classification
Category name(code) classified by JST.
Materials of solid-state devices 
(NC03020K)

About Materials of solid-state devices

Substance index (1)：
Substance index
Chemical Substance indexed to the Article.
TMAH

About TMAH

Terms in the title (2)：
Terms in the title
Keywords automatically extracted from the title.
EUV

About EUV

, 
ネガ型レジスト

About ネガ型レジスト


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