About YOSHINO K.
About Osaka Univ., Osaka, JPN
About YOSHINO K.
About Panasonic Corp., Osaka, JPN
About MORITA Y.
About Osaka Univ., Osaka, JPN
About MORITA Y.
About Panasonic Corp., Osaka, JPN
About NAGATOMI T.
About Osaka Univ., Osaka, JPN
About TERAUCHI M.
About Osaka Univ., Osaka, JPN
About TERAUCHI M.
About Panasonic Corp., Osaka, JPN
About TSUJITA T.
About Osaka Univ., Osaka, JPN
About TSUJITA T.
About Panasonic Corp., Osaka, JPN
About NAKAYAMA T.
About Panasonic Corp., Osaka, JPN
About YAMAUCHI Y.
About Panasonic Corp., Osaka, JPN
About NISHITANI M.
About Osaka Univ., Osaka, JPN
About NISHITANI M.
About Panasonic Corp., Osaka, JPN
About KITAGAWA M.
About Panasonic Corp., Osaka, JPN
About YAMAUCHI Y.
About National Inst. Materials Sci., Ibaraki, JPN
About TAKAI Y.
About Osaka Univ., Osaka, JPN
About Journal of Surface Analysis
About dielectric thin film
About magnesium oxide
About panel
About deexcitaion
About spectroscopy
About electronic structure
About electron affinity
About electron irradiation
About 1-10keV
About band gap
About secondary electron emission
About ionization potential
About temperature dependence
About removal
About sputtering
About heat treatment
About Auger spectrum
About Decontamination
About plasma display panel
About Oxide thin films
About Electronic structure of crystalline insulators
About プラズマディスプレイパネル
About MgO
About 薄膜
About 脱励起
About スペクトロスコピー
About 測定条件
About 研究