Art
J-GLOBAL ID：201302261607704034   Reference number：13A0098889

Impurity gas analysis in the sputtering process under high Ar gas pressure

高Arガス圧下のスパッタリングプロセスにおける不純物ガス分析
Author (4)：
SASAKI Shingo

About SASAKI Shingo

(Ichinoseki Nat’l Coll. Technol., Ichinoseki, JPN)

About Ichinoseki Nat’l Coll. Technol., Ichinoseki, JPN

, 
ISHIBASHI Shinichi

About ISHIBASHI Shinichi

(Tohoku Univ., Sendai, JPN)

About Tohoku Univ., Sendai, JPN

, 
SAITO Shin

About SAITO Shin

(Tohoku Univ., Sendai, JPN)

About Tohoku Univ., Sendai, JPN

, 
TAKAHASHI Migaku

About TAKAHASHI Migaku

(Tohoku Univ., Sendai, JPN)

About Tohoku Univ., Sendai, JPN


Material：
日本磁気学会学術講演概要集  (Abstracts. Annual Conference on Magnetics in Japan)

About 日本磁気学会学術講演概要集


Volume： 36th  Page： 113  Publication year： 2012 
JST Material Number： Y0056A  ISSN： 1882-2959  Document type： Proceedings
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
gas analysis

About gas analysis

, 
impurity

About impurity

, 
*sputtering

About sputtering

, 
pressure

About pressure

, 
argon

About argon

, 
*sputtered deposition

About sputtered deposition


JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (6)：
Terms in the title
Keywords automatically extracted from the title.
Arガス

About Arガス

, 
圧

About 圧

, 
スパッタリング

About スパッタリング

, 
プロセス

About プロセス

, 
不純物ガス

About 不純物ガス

, 
分析

About 分析


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