Art

J-GLOBAL ID：201602234444283179   Reference number：16A0782524

Contribution of CN(X²Σ⁺) radicals to N atoms of hydrogenated amorphous carbon nitride films formed from the microwave discharge of the gas mixture of N₂ and CH₃CN

N₂とCH₃CNのガス混合物のマイクロ波放電によって形成した水素化非晶質窒化炭素膜のN原子へのCN(X²Σ⁺)ラジカルの寄与

Author (4)： Ito Haruhiko (Nagaoka University of Technology, 1603-1 Kamitomioka, Nagaoka, Niigata 940-2188, Japan) ,  Mogi Nobuyoshi (Nagaoka University of Technology, 1603-1 Kamitomioka, Nagaoka, Niigata 940-2188, Japan) ,  Okada Kohtaro (Nagaoka University of Technology, 1603-1 Kamitomioka, Nagaoka, Niigata 940-2188, Japan) ,  Tsudome Hiroki (Nagaoka University of Technology, 1603-1 Kamitomioka, Nagaoka, Niigata 940-2188, Japan)
Material： Diamond and Related Materials  (Diam Relat Mater)
Volume： 63  Page： 125-131  Publication year： Mar. 2016 
JST Material Number： W0498A  ISSN： 0925-9635  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Thesaurus term： carbon compound ,  nitride ,  *evaporated film ,  amorphous state ,  hydrogenation ,  plasma CVD ,  *microwave discharge ,  Nitrogen ,  Argon ,  radical ,  scanning electron microscope ,  X-ray photoelectron spectroscopy ,  microscopic Raman spectroscopy ,  infrared absorption spectrum ,  optical absorption spectrum ,  fluorescence spectrum ,  electrical resistivity ,  electron configuration ,  atom ,  *nitrogen atom ,  aliphatic nitrile
Semi thesaurus term： *水素化非晶質窒化炭素膜 ,  *CNラジカル

Author keywords (5)： Hydrogenated amorphous carbon nitride ,  Plasma CVD ,  CH₃CN ,  N₂ plasma ,  Laser spectroscopy

JST classification (3)： Nitrogen and its compounds  (YB02050S) ,  Thin films of other inorganic compounds  (BK14060A) ,  Reaction due to charged particle bombardment and electric discharge  (CB06020R)

Substance index (1)： Acetonitrile

Terms in the title (10)： N2 ,  ガス混合物 ,  マイクロ波放電 ,  水素化 ,  非晶質 ,  窒化 ,  炭素膜 ,  N原子 ,  Cn ,  ラジカル