Art

J-GLOBAL ID：201702216047675408   Reference number：17A1007033

Influence of Substrate Materials on Deposition of Plasma-polymerized SiO:CH Particles

プラズマ重合SiO:CH粒子の析出に及ぼす基質材料の影響

Author (4)： Inoue Yasushi (Department of Advanced Materials Science and Engineering, Chiba Institute of Technology) ,  Koike Haruka (Department of Advanced Materials Science and Engineering, Chiba Institute of Technology) ,  Aihara Takumi (Department of Advanced Materials Science and Engineering, Chiba Institute of Technology) ,  Takai Osamu (Materials and Surface Engineering Research Institute, Kanto Gakuin University)
Material： Journal of Photopolymer Science and Technology  (フォトポリマー懇話会誌)
Volume： 30  Issue： 3  Page： 337-340(J-STAGE)  Publication year： 2017 
JST Material Number： L0202A  ISSN： 0914-9244  CODEN： JSTEEW  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： particle ,  functionalization ,  *plasma polymerization ,  precipitation(phase separation) ,  substrate(biochemistry) ,  evaluation ,  *plasma CVD ,  nucleation ,  particle size(diameter)
Semi thesaurus term： *silica particle ,  impact assessment ,  functionalization ,  *plasma enhanced chemical vapor deposition ,  mean grain diameter

Author keywords (3)： Chemical vapor deposition ,  SiO:CH particle ,  Self-organized structure

JST classification (3)： Radiation polymerization  (CG04060K) ,  Structure and morphology of polymer solids  (CG02022M) ,  Vapor plating  (WC08022K)

Substance index (1)： Trimethylmethoxysilane

Reference (10)：

• 1. O. Takai, A. Hozumi, and N. Sugimoto, J. Non- Crystal. Solids, 218 (1997) 280.
• 2. N. E. Blanchard, B. Hanselmann, J. Drosten, M. Heuberger, and D. Hegemann, Plasma Proc. Polym., 12 (2015) 32.
• 3. K. Teshima, H. Sugimura, Y. Inoue, and O. Takai, Langmuir, 19 (2003) 8331.
• 4. R. Charifou, E. Espuche, F. Gouanve, L. Dubost, and B. Monaco, J. Membrane Sci., 500 (2016) 245.
• 5. A. Grill and V. Oatel, Appl. Phys. Lett., 79 (2001) 803.

Terms in the title (5)： プラズマ重合 ,  SiO ,  CH ,  析出 ,  基質