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J-GLOBAL ID:201702216176355662   Reference number:17A1220967

Fabrication of hydrogenated amorphous silicon carbide films by decomposition of hexamethyldisilane with microwave discharge flow of Ar

ヘキサメチルジシランの分解による水素化非晶質炭化ケイ素膜の作製
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Volume: 55  Issue: 6S2  Page: 06HC01.1-06HC01.9  Publication year: Jun. 2016 
JST Material Number: G0520B  ISSN: 0021-4922  CODEN: JJAPB6  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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Thin films of other inorganic compounds  ,  Gas discharges  ,  Mechanical properties of solids in general 
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