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J-GLOBAL ID:201702264493826653   Reference number:17A1465162

Electronic properties of Si/Si-Ge Alloy/Si(100) heterostructures formed by ECR Ar plasma CVD without substrate heating

基板加熱無しでのECR ArプラズマCVDにより形成されたSi/SiGe Alloy/Si(100)ヘテロ構造の電子的性質【Powered by NICT】
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Material:
Volume: 70  Page: 55-62  Publication year: 2017 
JST Material Number: W1055A  ISSN: 1369-8001  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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JST classification (3):
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Materials of solid-state devices  ,  Photometry and photodetectors in general  ,  Semiconductor thin films 

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