About Ueno Naofumi
About Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
About Sakuraba Masao
About Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
About Osakabe Yoshihiro
About Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
About Akima Hisanao
About Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
About Sato Shigeo
About Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
About Materials Science in Semiconductor Processing
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About plasma exposure
About rectification (electric)
About silicon
About carrier density
About substrate temperature
About valence band
About plasma CVD
About heterojunction
About plasma
About Argon
About photoluminescence
About carrier mobility
About epitaxy
About Hall mobility
About hetero-structure
About Plasma chemical vapor deposition
About Heteroepitaxial growth
About Silicon
About Silicon-germanium alloy
About Valence band
About pn junction diode
About Materials of solid-state devices
About Photometry and photodetectors in general
About Semiconductor thin films
About Ar
About プラズマCVD
About Si
About SiGe
About ヘテロ構造
About 電子
About 性質