Art

J-GLOBAL ID：201702267836346117   Reference number：17A0132709

Room temperature atomic layer deposition of TiO₂ on gold nanoparticles

金ナノ粒子上へのTiO₂の室温式原子層堆積法

Author (6)： Kikuchi Ko (Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510, Japan) ,  Miura Masanori (Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510, Japan) ,  Kanomata Kensaku (Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510, Japan) ,  Ahmmad Bashir (Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510, Japan) ,  Kubota Shigeru (Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510, Japan) ,  Hirose Fumihiko (Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510, Japan)
Material： Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films  (Journal of Vacuum Science and Technology. A. Vacuum, Surfaces, and Films)
Volume： 35  Issue： 1  Page： 01B121-01B121-5  Publication year： Jan. 2017 
JST Material Number： C0789B  ISSN： 0734-2101  CODEN： JVTAD6  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Thesaurus term： *chemical vapor deposition ,  *titanium oxide ,  Gold ,  *nano particle ,  substrate (plate) ,  silicon ,  *growth rate ,  *covering ,  *film thickness ,  Adsorption ,  performance ,  electrostatic adsorption ,  cycle performance
Semi thesaurus term： *ALD ,  共形被覆 ,  cycle performance

JST classification (1)： Oxide thin films  (BK14050P)

Terms in the title (4)： 金ナノ粒子 ,  TiO2 ,  室温 ,  原子層堆積法