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J-GLOBAL ID：201702284452621714   Reference number：17A1421035

Effects of source gases on the properties of silicon/nitrogen-incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition

プラズマ化学蒸着で作製したsilicon/nitrogen組み込みダイヤモンド状炭素膜の特性に及ぼす原料ガスの影響【Powered by NICT】

Author (6)： Nakazawa Hideki (Graduate School of Science and Technology, Hirosaki University, 3 Bunkyo, Hirosaki, Aomori 036-8561, Japan) ,  Magara Kohei (Graduate School of Science and Technology, Hirosaki University, 3 Bunkyo, Hirosaki, Aomori 036-8561, Japan) ,  Takami Takahiro (Graduate School of Science and Technology, Hirosaki University, 3 Bunkyo, Hirosaki, Aomori 036-8561, Japan) ,  Ogasawara Haruka (Graduate School of Science and Technology, Hirosaki University, 3 Bunkyo, Hirosaki, Aomori 036-8561, Japan) ,  Enta Yoshiharu (Graduate School of Science and Technology, Hirosaki University, 3 Bunkyo, Hirosaki, Aomori 036-8561, Japan) ,  Suzuki Yushi (Graduate School of Science and Technology, Hirosaki University, 3 Bunkyo, Hirosaki, Aomori 036-8561, Japan)
Material： Thin Solid Films
Volume： 636  Page： 177-182  Publication year： 2017 
JST Material Number： B0899A  ISSN： 0040-6090  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Abstract/Point： We have deposited silicon/nitr...

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Thesaurus term： abrasion resistance ,  *chemical vapor deposition ,  internal stress ,  wear rate ,  *plasma CVD ,  DLC film ,  silicon ,  bond strength ,  flow ratio ,  mechanical property ,  resistance (endure)

Author keywords (7)： Diamond-like carbon ,  Silicon ,  Nitrogen ,  Tribology ,  Internal stress ,  Adhesion ,  Chemical vapor deposition

JST classification (1)： Thin films of other inorganic compounds  (BK14060A)

Terms in the title (5)： プラズマ化学蒸着 ,  作製 ,  組み込み ,  ダイヤモンド状炭素 ,  原料ガス