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J-GLOBAL ID:201801005384174515 Update date: Dec. 20, 2018

Sato Tsuneyuki

Sato Tsuneyuki
Clips

Lectures and oral presentations (50)

  • Simulation of chemical absorption of two-gases in a wetted-wall column(査読付)
    (World Congress III of chemical engineering, 471?474(Tokyo 1986))
  • 化学工業における誘電泳動の応用
    (ケミカルエンジニアリング、第33巻、第6号、pp.65?71(1988))
  • Numerical Simulation of horizontal CVD reactor ?Effect of fluid dynamics, gas-phase and surface kinetics?(査読付)
    (3rd ASME-JSME Thermal Engineering Joint Conference, Vol. 1,399?406(reno 1991))
  • Simulation of LPMOCVD of ZrO2 thin film(査読付)
    (Engineering Foundation Conference on Vapor phase manufacture of ceramics, 12-17(Hawaii 1992))
  • LPMOCVD of YSZ thin film ?Experiments and model analysis?(査読付)
    (12th Int. Symp. Chemical Vapor Deposition, 303?305(Hawaii 1993))
  • Reactivity of chemical species on growing surface in CVD(査読付)
    (12th Int. Symp. Chem. Vapor Deposition, 300-302(Hawaii 1993))
  • How to model CVD processes ?Present understanding of CVD mechanism?(査読付)
    (12th Int. Symp. Chemical Vapor Deposition, pp.96?102(Hawaii 1993))
  • Development of simulation method for heat and mass transfer with hygrostress crack formation and propagation in viscoelastic food of a hollow cylinder(査読付)
    (Inst. Food Technologist Annual Meeting, pp.203(Atlanta 1994))
  • Development of computerized simulation method for heat and mass transfer and hygrophysical changes in viscoelastic non-homogeneous food of a solid cylinder(査読付)
    (Inst. Food Technologist Annual Meeting, pp.204(Atlanta 1994))
  • A parametric analysis for heat and mass transfer and hygrophysical changes in a viscoelastic food of solid cylinder during drying(査読付)
    (Inst. Food Technologist Annual Meeting, pp.226(Atlanta 1994))
  • Micro-Macro modeling of YSZ thin film growth by MOCVD(査読付)
    (1st Int. Symp. Advanced Energy conversion system and ProcessAnalysis, 2-A-14, pp.279?286(Nagoya 1995))
  • Occlusion of micro-size trench and hole by thin film growth via CVD(査読付)
    (4th ASME/JSME thermal engineering joint conference, Vol.2, pp.447?452(Hawaii 1995))
  • 水平型CVD装置における流動ならびに熱物質移動
    (化学工学会第39回秋季大会(北海道))
  • 縦型熱CVD装置における成膜速度に及ぼす基盤回転の影響
    (化学工学会第28回秋季大会p.254(1995、北海道))
  • LPMOCVD of oxide thin films ?Micro and Macro analysis of CVD reaction?(査読付)
    (2nd Korea-Japan Symp. Advanced Materials, pp.164?171(Seoul 1996))
  • Micro/Macro modeling of CVD synthsis(査読付)
    (International Workshop on modeling in Crystal Growth (Belgium 1996)pp.10-15)
  • Modeling of CVD synthesis of oxide thin films(査読付)
    (ICHMT Symp.Molecular and Microscale Heat Transfer in Materilas Processing and other applications, Vol.1, pp.378?388(Yokohama 1996))
  • Transport phenomena in a horizontal cold-wall CVD reactor(査読付)
    (Joint Meeting JSME/KSME Thermal Engineering, Vol. 2, pp.59?64(Kyonju 1996))
  • Numerical simulation of solutal Marangoni convection during liquid mixing under microgravity
    (2nd Inter. Joint Symp. between Kyushu Univ. and Chungnam National Univ., pp.30?47(1996))
  • Three dimensional unsteady Marangoni convection in half zone ?Growth rate and critical Marangoni nunmber?(査読付)
    (12th Int. Conf. Crystal Growth(ICCG12), (Jerusalem 1998)pp.14-18)

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