Art

J-GLOBAL ID：201802247168924572   Reference number：18A1022525

Ionization of sputtered carbon species by high-power inductively-coupled impulse sputtering (ICIS)

高出力誘導結合インパルススパッタリング(ICIS)によるスパッタ炭素種のイオン化【JST・京大機械翻訳】

Author (4)： Yukimura Ken (Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 2, Tsukuba, Ibaraki, 305-8568, Japan) ,  Yukimura Ken (Soft-Path Engineering Research Center (SPERC), Faculty of Engineering, Iwate University, Morioka, 020-8551, Japan) ,  Ogiso Hisato (Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki, Tsukuba, Ibaraki, 305-8564, Japan) ,  Nakano Shizuka (Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki, Tsukuba, Ibaraki, 305-8564, Japan)
Material： Vacuum
Volume： 153  Page： 195-203  Publication year： 2018 
JST Material Number： E0347A  ISSN： 0042-207X  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)

Abstract/Point： A high-power inductively-coupl...

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Thesaurus term： *electromagnetic coupling ,  voltage ,  emission spectrum ,  electric current ,  plasma source ,  inductively coupled plasma ,  plasma ,  frequency (Hz) ,  *Carbon ,  *pulse ,  current density ,  wavelength ,  *ionization ,  emission intensity
Semi thesaurus term： バイアス電圧 , 【Automatic Indexing@JST】

Author keywords (11)： Inductively coupled impulse sputtering ,  High power impulse magnetron sputtering ,  High power pulsed sputtering ,  Glow discharge ,  Inductively-coupled plasma ,  Plasma density ,  Electron temperature ,  Carbon ions ,  ICIS ,  HiPIMS ,  HPPMS

JST classification (2)： Thin films of other inorganic compounds  (BK14060A) ,  Techniques and equipment of thin film deposition  (BK14020I)

Terms in the title (7)： 高出力 ,  誘導結合 ,  インパルス ,  スパッタリング ,  スパッタ ,  炭素 ,  イオン化