Art

J-GLOBAL ID：201802251927645761   Reference number：18A2218089

Effect of Si incorporation on corrosion resistance of hydrogenated amorphous carbon film

水素化非晶質炭素膜の耐食性に及ぼすSi混入の影響【JST・京大機械翻訳】

Author (6)： Nishikawa Jumpei (Department of Mechanical Engineering, School of Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8552, Japan) ,  Sugihara Naoki (Department of Mechanical Engineering, School of Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8552, Japan) ,  Nakano Masayuki (Department of Chemical Science and Engineering, National Institute of Technology, Tokyo College, 1220-2 Kunugida, Hachioji, Tokyo 193-0997, Japan) ,  Hieda Junko (Department of Chemical Systems Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan) ,  Ohtake Naoto (Laboratory for Future Interdisciplinary Research of Science and Technology (FIRST), Institute of Innovative Research (IIR), Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama, Kanagawa 226-8503, Japan) ,  Akasaka Hiroki (Department of Mechanical Engineering, School of Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8552, Japan)
Material： Diamond and Related Materials  (Diam Relat Mater)
Volume： 90  Page： 207-213  Publication year： 2018 
JST Material Number： W0498A  ISSN： 0925-9635  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Abstract/Point： Effect of silicon (Si) additio...

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Thesaurus term： robustness ,  *amorphous state ,  *silicon ,  *hydrogenation ,  Nitric Acid ,  plasma CVD ,  *corrosion resistance ,  silicon monoxide ,  Surface Plasmon Resonance ,  *amorphous carbon ,  *carbon film
Semi thesaurus term： エッチング速度 , 【Automatic Indexing@JST】

JST classification (2)： Thin films of other inorganic compounds  (BK14060A) ,  Carbon and its compounds  (YB02060D)

Substance index (1)： Tetramethylsilane

Terms in the title (6)： 水素化 ,  非晶質 ,  炭素膜 ,  耐食性 ,  Si ,  混入