Art

J-GLOBAL ID：201902246893102210   Reference number：19A2403927

Conductance interference effects in an electron-beam-resist-free chemical vapor deposition graphene device sandwiched between two h-BN sheets

2つのh-BNシート間の電子ビームレジストフリー化学蒸着グラフェンデバイスにおけるコンダクタンス干渉効果【JST・京大機械翻訳】

Author (12)： Chuang Chiashain (Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan, 320, Taiwan) ,  Mineharu Masaaki (Department of Materials Science, Chiba University, Chiba, 263-8522, Japan) ,  Matsunaga Masahiro (Department of Materials Science, Chiba University, Chiba, 263-8522, Japan) ,  Matsunaga Masahiro (Venture Business Laboratory, Nagoya University, Nagoya, 464-8601, Japan) ,  Liu Chieh-Wen (Department of Physics, Case Western Reserve University, 2076 Adelber Road, Cleveland, OH, 44106, USA) ,  Liu Chieh-Wen (Graduate Institute of Applied Physics, National Taiwan University, Taipei, 106, Taiwan) ,  Wu Bi-Yi (Graduate Institute of Applied Physics, National Taiwan University, Taipei, 106, Taiwan) ,  Kim Gil-Ho (School of Electronic and Electrical Engineering and Sungkyunkwan Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, 16419, South Korea) ,  Watanabe Kenji (Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namki, Tsukuba, 305-0044, Japan) ,  Taniguchi Takashi (Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namki, Tsukuba, 305-0044, Japan) ,  Liang Chi-Te (Graduate Institute of Applied Physics, National Taiwan University, Taipei, 106, Taiwan) ,  Aoki Nobuyuki (Department of Materials Science, Chiba University, Chiba, 263-8522, Japan)
Material： Carbon
Volume： 154  Page： 238-243  Publication year： 2019 
JST Material Number： H0270B  ISSN： 0008-6223  CODEN： CRBNA  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)

Abstract/Point： We report fabrication and meas...

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Thesaurus term： boron nitride ,  mobility(ratio) ,  *conductance ,  substrate(plate) ,  electron beam lithography ,  annealing(heat treatment) ,  suspension(disperse system) ,  *interference ,  *chemical vapor deposition ,  sulfur fluoride ,  etching ,  *graphene
Semi thesaurus term： 電子素子 ,  ヘテロ構造 ,  *六方晶窒化ホウ素 , 【Automatic Indexing@JST】

Author keywords (5)： Graphene ,  Chemical vapor deposition ,  Boron nitride ,  Coherent ,  Interference

JST classification (2)： Carbon and its compounds  (YB02060D) ,  Thin films of other inorganic compounds  (BK14060A)

Terms in the title (6)： h-BN ,  電子ビームレジスト ,  化学蒸着 ,  グラフェン ,  コンダクタンス ,  干渉効果