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J-GLOBAL ID：202002225642881971   Reference number：20A2773747

Multiphoton-Excited Deep-Ultraviolet Photolithography for 3D Nanofabrication

3Dナノ加工のための多光子励起深紫外線フォトリソグラフィー【JST・京大機械翻訳】

Author (9)： Taguchi Atsushi (Department of Applied Physics, Osaka University, Osaka, Japan) ,  Nakayama Atsushi (Department of Applied Physics, Osaka University, Osaka, Japan) ,  Nakayama Atsushi (Advanced Photonics and Biosensing Open Innovation Laboratory, AIST-Osaka University, Osaka, Japan) ,  Oketani Ryosuke (Department of Applied Physics, Osaka University, Osaka, Japan) ,  Kawata Satoshi (Department of Applied Physics, Osaka University, Osaka, Japan) ,  Kawata Satoshi (Serendip Research, Osaka, Japan) ,  Fujita Katsumasa (Department of Applied Physics, Osaka University, Osaka, Japan) ,  Fujita Katsumasa (Transdimensional Life Imaging Division, Institute for Open and Transdisciplinary Research Initiatives, Osaka University, Osaka, Japan) ,  Fujita Katsumasa (Advanced Photonics and Biosensing Open Innovation Laboratory, AIST-Osaka University, Osaka, Japan)
Material： ACS Applied Nano Materials
Volume： 3  Issue： 11  Page： 11434-11441  Publication year： 2020 
JST Material Number： W5033A  ISSN： 2574-0970  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Abstract/Point： Light-matter interactions in t...

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Thesaurus term： *photon ,  Luminescence ,  wavelength ,  photopolymerization ,  amino acid ,  monomer ,  oligomer ,  visible light ,  visible laser ,  *lithography ,  *three dimension ,  *multiple photon excitation ,  *nanometer process ,  *photolithography ,  aliphatic amine ,  thiol ,  aliphatic carboxylic acid ,  sulfur containing amino acid ,  primary amine

Author keywords (6)： two-photon polymerization ,  initiator free ,  DUV absorption ,  metal oxides ,  amino acids ,  3D printing

JST classification (1)： Manufacturing technology of solid-state devices  (NC03030V)

Substance index (1)： Cysteine

Terms in the title (5)： 3D ,  ナノ加工 ,  多光子励起 ,  深紫外線 ,  フォトリソグラフィー