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J-GLOBAL ID:202002238526931015   Reference number:20A1762513

Evaluation of Thick-Film Photoresist for Grayscale Lithography Utilizing Direct Laser Writing

レーザ直接描画を用いたグレイスケールリソグラフィにおける厚膜レジストの評価
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Volume: 140  Issue:Page: 113-118(J-STAGE)  Publication year: 2020 
JST Material Number: L3098A  ISSN: 1341-8939  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Manufacturing technology of solid-state devices  ,  Optical devices in general 
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