Karsten Arts, Satoshi Hamaguchi, Tomoko Ito, Kazuhiro Karahashi, Harm C M Knoops, Adriaan J M Mackus, Wilhelmus M M, Kessels. Foundations of atomic-level plasma processing in nanoelectronics. 2022. 31. 10. 103002-103002
Tomoko Ito, Hidekazu Kita, Kazuhiro Karahashi, Satoshi Hamaguchi. Low-energy ion irradiation effects on chlorine desorption in plasma-enhanced atomic layer deposition (PEALD) for silicon nitride. Japanese Journal of Applied Physics. 2022. 61. SI. SI1011-SI1011
Artificial bone and manufacturing method of artificial bone
放射性プルーム監視システムおよび放射性物質検出装置
講演・口頭発表等 (70件):
Surface analyses of β-diketone-adsorbed transition metal materials in atomic layer etching (ALE) processes
(14th EU-Japan Joint Symposium on Plasma Processing (JSPP-14) 2023)
Surface reactions of Si and SiO 2 exposed t o energetic tungsten fluoride ion beams
(14th EU-Japan Joint Symposium on Plasma Processing (JSPP-14) 2023)
Thermal and Plasma-enhanced Atomic Layer Deposition of Strontium Oxide on Artificial Spinal Cage
(14th EU-Japan Joint Symposium on Plasma Processing (JSPP-14) 2023)