| 詳細情報 |  |
|---|---|
| 関連リンク |  |
| 探す |  |
MISC (108件)
- Kikuo Tominaga, Takuya Kikuma, Kazuya Kusaka, Takao Hanabusa. Energetic oxygen ions in zro2 deposition by reactive sputtering of zr. Vacuum. 2002. 66. 3-4. 279-284
- Effect of Sputtering Gas Pressure and Nitrogen Concentration on Crystal Orientation and Residual Stress in Sputtered AlN. Vacuum. 2002. 66(3-4), 441-446
- GaN Films Deposited by Planar Magnetron Sputtering. Vacuum. 2002. 66(3-4), 233-237
- Film Properties of ZnO:Al Films Deposited by Co-spttering of ZnO : Al and contaminated Zn targets with Co, Mn and Cr. Vacuum. 2002. 66(3-4), 511-515
- Amorphous ZnO-In2O3 Transparent Conductive Films by Simultaneous Sputtering Method of ZnO and In2O3 Targets. Vacuum. 2002. 66(3-4), 505-509
- Effect of Sputtering Gas Pressure and Nitrogen Concentration on Crystal Orientation and Residual Stress in Sputtered AlN. Vacuum. 2002. 66(3-4), 441-446
- GaN Films Deposited by Planar Magnetron Sputtering. Vacuum. 2002. 66(3-4), 233-237
- Film Properties of ZnO:Al Films Deposited by Co-spttering of ZnO : Al and contaminated Zn targets with Co, Mn and Cr. Vacuum. 2002. 66(3-4), 511-515
- Amorphous ZnO-In2O3 Transparent Conductive Films by Simultaneous Sputtering Method of ZnO and In2O3 Targets. Vacuum. 2002. 66(3-4), 505-509
- Structural variation of Thin Films Deposited from Zn3In2O6 Target by RF-Sputtering. Matetrials Research Bulletin. 2001. 36(), 1075-1082
- Crystallization Process of Transparent Conductive Oxides ZnRIn2OR+3. J. Synchrotoron Radiation. 2001. 8(), 785-787
- Effect of Insertion of Thin ZnO Layer in Transparent Conductive ZnO : Al Film. Thin Solid Films. 2001. 386(), 267-270
- Energetic Oxygen Ions in the Reactive Sputtering of the Zr targets in Ar+O<sub>2</sub> Atmosphere. J. Vacuum Science & technology. 2001. 19(), 1582-1585
- Structural variation of Thin Films Deposited from Zn3In2O6 Target by RF-Sputtering. Matetrials Research Bulletin. 2001. 36(), 1075-1082
- Crystallization Process of Transparent Conductive Oxides ZnRIn2OR+3. J. Synchrotoron Radiation. 2001. 8(), 785-787
- Effect of Insertion of Thin ZnO Layer in Transparent Conductive ZnO : Al Film. Thin Solid Films. 2001. 386(), 267-270
- Energetic Oxygen Ions in the Reactive Sputtering of the Zr targets in Ar+O2 Atmosphere. J. Vacuum Science & technology. 2001. 19(), 1582-1585
- T Moriga, T Okamoto, K Hiruta, A Fujiwara, Nakabayashi, I, K Tominaga. Structures and physical properties of films deposited by simultaneous DC sputtering of ZnO and In2O3 or ITO targets. JOURNAL OF SOLID STATE CHEMISTRY. 2000. 155. 2. 312-319
- Relationship between Grain Size and Residual Stress in AlN Sputtered Film. Proc.6th International Conf. on residual Stresses. 2000. , 391-398
- Effect of Input Power on Crystal Orientation and Residual Stress in AlN Film Deposition by dc Sputtering. Vacuum. 2000. 59(), 806-813
前のページに戻る
