Rchr
J-GLOBAL ID:200901070571639102   Update date: Feb. 01, 2024

Nunomura Shota

ヌノムラ ショウタ | Nunomura Shota
Affiliation and department:
Research field  (4): Electric/electronic material engineering ,  Thin-film surfaces and interfaces ,  Applied plasma science ,  Basic plasma science
Research keywords  (6): plasma ,  semiconductor ,  defects ,  hydrogen ,  solar cells ,  passivation
Research theme for competitive and other funds  (6):
  • 2020 - 2024 Mechanism elucidation of spatio-temporal structure formation of sheath fluctuation using optically trapped fine particles in plasmas
  • 2018 - 2021 Hydrogen-mediated defect passivation of semiconductor materials during plasma processing
  • 2015 - 2018 Generation and annihilation mechanisms of plasma-induced defects on semiconductor surface
  • 2012 - 2015 Transport properties and defect kinetics during silicon thin film growth
  • 2002 - 2005 微粒子プラズマ中の波動と物質創製に関する研究
Show all
Papers (58):
more...
MISC (4):
Work history (4):
  • 2020/04 - 現在 Kyushu University
  • 2012/12 - 2013/12 Univ. Michigan Visiting Scholar
  • 2002/04 - 2003/09 JSPS Research Fellow Max Planck Institute postdoc researcher
  • 1999/06 - 2001/05 JSPS Research Fellow for overseas countries Univ. Iowa postdoc researcher
Committee career (2):
  • 2020/04 - 現在 APEX/JJAP editor
  • 2018/04 - 現在 応用物理学会 シリコンテクノロジー分科会 委員
Awards (4):
  • 2021/03 - 応用物理学科会 シリコンテクノロジー分科会 論文賞
  • 2021/01 - プラズマ材料科学賞 奨励部門賞
  • 2019/03 - 応用物理学科会 プラズマエレクトロニクス賞
  • 2018/10 - 堀場雅夫賞
Association Membership(s) (3):
応用物理学会 ,  AVS ,  MRS
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