Rchr
J-GLOBAL ID：200901093192805445
Update date: Jun. 29, 2022
Chayahara Akiyoshi
チャヤハラ アキヨシ | Chayahara Akiyoshi
Affiliation and department：
Job title：
Invited Senior Researcher
Homepage URL (1)：
http://www.aist.go.jp/RESEARCHERDB/cgi-bin/worker_detail.cgi?call=namae&rw_id=A72242350
Research field (1)：
Material fabrication and microstructure control
Research keywords (7)：
ダイヤモンド プラズマプロセス イオンビーム加工 イオン注入 薄膜形成
, Plasma
, Ion implantation
, Ion Beam
, Thin Film
, Surface Improvement
, diamond
Research theme for competitive and other funds (3)：
- イオン照射効果、イオン注入・成膜
- ダイヤモンド単結晶成長
- diamond growth
MISC (47)：
-
Hideaki Yamada, Akiyoshi Chayahara, Yoshiaki Mokuno, Yousuke Soda, Yuji Horino, Shin-ichi Shikata, Naoji Fujimori. Qualitative correspondences of experimentally obtained growth rates and morphology of single-crystal diamond with numerical predictions of plasma and gas dynamics in microwave discharges for various substrate holder shapes. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. 2006. 45. 10B. 8177-8182
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Hideaki Yamada, Akiyoshi Chayahara, Yoshiaki Mokuno, Yuji Horino, Shinichi Shikata. Simulation of temperature and gas flow distributions in region close to a diamond substrate with finite thickness. DIAMOND AND RELATED MATERIALS. 2006. 15. 10. 1738-1742
-
Hideaki Yamada, Akiyoshi Chayahara, Yoshiaki Mokuno, Yuji Horino, Shinichi Shikata. Simulation of microwave plasmas concentrated on the top surface of a diamond substrate with finite thickness. DIAMOND AND RELATED MATERIALS. 2006. 15. 9. 1383-1388
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H. Yamada, A. Chayahara, Y. Mokuno, Y. Horino, S. Shikata. Numerical analyses of a microwave plasma chemical vapor deposition reactor for thick diamond syntheses. DIAMOND AND RELATED MATERIALS. 2006. 15. 9. 1389-1394
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Hideaki Yamada, Akiyoshi Chayahara, Yoshiaki Mokuno, Yousuke Soda, Yuji Horino, Naoji Fujimori. Numerical analysis of power absorption and gas pressure dependence of microwave plasma using a tractable plasma description. DIAMOND AND RELATED MATERIALS. 2006. 15. 9. 1395-1399
ｍore...
Patents (3)：
-
薄膜形成装置および薄膜形成方法
-
炭化珪素埋め込み層を有するシリコン基盤の製造方法
-
Method of forming a highly pure thin film and apparatus there for
Education (4)：
- Hiroshima University
- Hiroshima University Graduate School of Engineering
- Hiroshima University
- Hiroshima University, Graduate School of Engineering
Professional career (1)：
Work history (3)：
- 1988 - 大阪工業技術試験所(現研究所)入所
- 1988 - Government Industrial Research Institute,
- (Present : Osaka National Research Institute, AIST)
Association Membership(s) (4)：
表面技術協会
, 応用物理学会
, The Surface Finishing Society of Japan
, The Japan Society of Applied Physics
