Rchr
J-GLOBAL ID:202001011805920660
Update date: Oct. 04, 2024
Osaka Ai
オオサカ アイ | Osaka Ai
Affiliation and department:
Job title:
Assistant Professor
Other affiliations (1):
Research field (3):
Machine elements and tribology
, Nanostructure physics
, Manufacturing and production engineering
Research keywords (5):
Catalyst
, 三次元ナノ構造科学
, strongly correlated electron system
, Surface treatment
, Polishing
Research theme for competitive and other funds (7):
- 2024 - 2027 基板表面性状制御によるニッケル酸化物薄膜の高濃度水素貯蔵性能の創出
- 2022 - 2025 Challenge of high concentration hydrogen storage in fullerenes utilizing chemical-mechanical reaction
- 2024 - 2025 強相関酸化物の構造因子制御による柔軟応答性の創出
- 2022 - 2024 高精度ナノ-マイクロVO2立体構造支配によるマルチガスセンサ性能の創出
- 2022 - 2024 化学研磨の応用による遷移金属酸化物薄膜の物性加工技術構築
- 2020 - 2022 Enhanced Phase Transition Properties in Fe3O4 Ultrathin Film Grown on Atomically Flat and Ordered Substrate
- 2014 - 2017 触媒反応を利用した純水のみによる超精密表面加工法の開発
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Papers (41):
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Seiji Nakashima, Koji Kimura, Naohisa Happo, Artoni Kevin R. Ang, Yuta Yamamoto, Halubai Sekhar, Ai I. Osaka, Koichi Hayashi, Hironori Fujisawa. Intermediate multidomain state in single-crystalline Mn-doped BiFeO3 thin films during ferroelectric polarization switching. Scientific Reports. 2024. 14. 1
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Michihiro Yamada, Shota Suzuki, Ai I. Osaka, Kazuaki Sumi, Takahiro Inoue, Azusa N. Hattori, Shinya Yamada, Kentarou Sawano, Marwan Dhamrin, Kohei Hamaya. Al-Ge-paste-induced liquid phase epitaxy of Si-rich SiGe(111) for epitaxial Co-based Heusler alloys. Materials Science in Semiconductor Processing. 2024. 174
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D. Toh, K. Kayao, R. Ohnishi, A. I. Osaka, K. Yamauchi, Y. Sano. Bias-assisted photoelectrochemical planarization of GaN (0001) with impurity concentration distribution. AIP Advances. 2023
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Umar Sidik, Azusa N. Hattori, Hao-Bo Li, Shin Nonaka, Ai I. Osaka, Hidekazu Tanaka. Strain effect on proton-memristive NdNiO3 thin film devices. Applied Physics Express. 2023. 16. 1. 014001-014001
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Ken Hattori, Yuya Sakai, Liliany N. Pamasi, Aydar Irmikimov, Takaaki Higashi, HaoBang Yang, XiaoQian Shi, FangZhun Guo, Ai I. Osaka, Hidekazu Tanaka, et al. Accessibility of ARPES for Three-dimensionally Architected Si{111}7×7 Facet Surfaces on Micro-patterned Si(110). e-Journal of Surface Science and Nanotechnology. 2022. 20. 4. 214-220
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MISC (39):
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服部梓, 永井正也, 大坂藍, 玄地真悟, REN H., 田中秀和. Nonlinear Electric Field Enhancement by intense THz pulses coupling of the inhomogeneous metallic VO2 nano structure. 日本物理学会講演概要集(CD-ROM). 2024. 79. 1
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梅崎景都, 大坂藍, 服部梓, 田中秀和. Improved Resistance Change Ratio of SmNiO3 by Hydrogen Diffusion on Crystalline Ordered and Flat Substrate. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2023. 70th
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井田有紀, 北川喜宏, JUHARNI, 清水智也, 高橋駿太, 大坂藍, 服部梓, 田中秀和, 桃野浩樹, 服部賢. Correlation of surface roughness with RHEED patterns. 日本物理学会講演概要集(CD-ROM). 2023. 78. 1
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今山航, 木元康成, MABARROH Ni’matil, 阪井雄也, 東嵩晃, 服部梓, 大坂藍, 田中秀和, 服部賢. Surface control of three-dimensional Si{111} facet-line structures in sub μm size. 日本物理学会講演概要集(CD-ROM). 2023. 78. 1
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花島隆泰, 阿久津和宏, 大坂藍, 田中秀和, 服部梓, 吉良弘, 宮田登, 鈴木淳市, 加倉井和久. Experiment of polarized neutron off-specular scattering under weak magnetic field. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2023. 84th
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Patents (4):
Lectures and oral presentations (8):
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グラフェン/BiFeO3/SrRuO3構造の光起電力効果
(第41回強誘電体会議 2024)
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光電子ホログラフィーを用いたMnドープBiFeO3薄膜の局所構造解析
(第71回応用物理学会春季学術講演会 2024)
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フォトリソグラフィ工程におけるレジストの凝固が(Hf,Zr)O2薄膜の結晶化に与える影響
(第71回応用物理学会春季学術講演会 2024)
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VO2マイクロチャネルで顕在化した結晶配向に依存した特異な相転移特性
(第9回 材料シンポジウムワークショップ 2023)
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弱磁場条件下の偏極中性子オフスペキュラー散乱
(第84回応用物理学会秋季学術講演会 2023)
more...
Education (3):
- 2014 - 2017 Osaka University Graduate School of Engineering Department of Precision Engineering
- 2012 - 2014 Osaka University Graduate School of Engineering Department of Precision Engineering
- 2008 - 2012 Osaka University School of Engineering
Professional career (1):
Work history (4):
- 2023/04 - 現在 Osaka University SANKEN
- 2023/04 - 現在 University of Hyogo Graduate School of Engineering
- 2019/10 - 2023/03 Osaka University The Institute of Scientific and Industrial Research Nanoscience and Nanotechnology Center
- 2017/04 - 2019/09 Mitsubishi Heavy Industries
Awards (2):
- 2020/09 - the Japan Society for Precision Engineering, please click here. Click here for details Best Presentation Award
- 2014/11 - Doi Award Planarization of 4H-SiC(0001) by Catalyst-Referred Etching Using Pure Water Etchant
Association Membership(s) (3):
日本表面真空学会
, The Japan Society of Applied Physics
, 精密工学会
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